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1. [Re] [AMPS] 8877 (score: 1): Author: park@surface.kriss.re.kr (Y. Park 박용섭); Date: Thu, 4 Feb 1999 18:54:37 +0900 (KST); RF plasma generation. It is widely used for thin film coating and semiconductor processing. There are lots of industrial RF generators/amplifiers for this purpose, usually at a fixed frequency. -- &; /archives//html/Amps/1999-02/msg00123.html (7,321 bytes)

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